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City of Industry, CA -- (SBWire) -- 09/06/2018 --This report presents the worldwide Nanoimprint Lithography (NIL) Equipment market size (value, production and consumption), splits the breakdown (data status 2013-2018 and forecast to 2025), by manufacturers, region, type and application.

This study also analyzes the market status, market share, growth rate, future trends, market drivers, opportunities and challenges, risks and entry barriers, sales channels, distributors and Porter's Five Forces Analysis.

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.

Application segment consists of Consumer electronics, Optical equipment, and others. Optical equipment segment is estimated to account for a revenue/volume share of over 47.59% in 2017.

China, North America, Europe, Japan, Rest of World are the five regions that are included in this report. Europe is the dominant market in the global Nanoimprint Lithography (NIL) Equipment market in terms of value/volume. The Europe Nanoimprint Lithography (NIL) Equipment market was estimated to be valued at 86 units in 2017. The North America market is expected to expand at a robust rate in terms of revenue over the forecast period due to the steadily increasing production capacity in this region.

New report published by QY Research which offers insights on the global Nanoimprint Lithography (NIL) Equipment market. The Nanoimprint Lithography (NIL) Equipment market has been experiencing steady growth graph since past years. During the 2018-2023 timeline, the global market for Nanoimprint Lithography (NIL) Equipment is expected to reflect a 1.9x increase in the revenue growth. In 2017 the global Nanoimprint Lithography (NIL) Equipment market was valued at US$ 60.6 Mn and by the end of the assessment year (2023), it is estimated to touch a value more than US$ 115 Mn growing at a value CAGR of 11.51% throughout the period of forecast.

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The following manufacturers are covered in this report:

Obducat

EV Group

Canon(Molecular Imprints)

Nanonex

Suss MicroTec

GuangDuo Nano

Nanoimprint Lithography (NIL) Equipment Breakdown Data by Type

Hot Nanoimprint Lithography

Room Temperature Nanoimprint Lithography

Nanoimprint Lithography (NIL) Equipment Breakdown Data by Application

Consumer Electronics

Optical Equipment

Others

Nanoimprint Lithography (NIL) Equipment Production by Region

United States

Europe

China

Japan

Other Regions

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