Photoresist Market by Photoresist Type (ArF Immersion, ArF Dry, KrF, I-Line, G-Line), Photoresist Ancillaries Type (Anti-Reflective Coatings, Remover, Developer), Application, and Region - Global Forecast to 2022

Seattle, WA -- (SBWire) -- 11/23/2017 --A photoresist is a light-sensitive material, which is applied to a substrate during photolithography or photoengraving to enable the desired pattern to be imaged. A properly exposed and developed photoresist masks portions of the substrate with high precision. Photoresist ancillaries are supporting materials used to improve the efficiency and resolution of the photolithography process. Photoresist is used in semiconductors & ICs, LCDs, printed circuit boards, and others application. This growth of these applications is driving the photoresist market globally.

Semiconductors & ICs is estimated to be the largest application segment of the global photoresist market

Among applications, the semiconductors & ICs segment is estimated to lead the global photoresist market during the forecast period. Photoresist is used in the electronics industry, particularly in semiconductors & ICs, and printed circuit board designs. ICs are used in a large number of electronics devices, including smartphones, mobile devices, PCs & laptops, tablets, and advanced gaming devices. Photoresist is a thin layer used to transfer a circuit pattern to the semiconductor substrate, which it is deposited upon. The increase in demand for wearable devices and consumer electronics act as key growth drivers for photoresist market.

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Based on type, the ArF immersion is projected to be the fastest-growing segment of the global photoresist market

The ArF immersion technology is widely used in Large Scale Integration (LSI) circuits. The narrow wavelength of ArF light source and increased refractive index due to immersion assist photoresist users in meeting their needs of miniaturizing products with improved performance. The demand for ArF immersion photoresist is growing due to its unique properties, such as narrow wavelength, which prevents spreading of light.

Asia-Pacific accounted for the largest share of the global photoresist market in 2016. Currently, Taiwan is the largest market for photoresist in the Asia-Pacific region and is expected to continue its dominance during the forecast period. In China and Japan, the demand for photoresist is expected to increase due to the growing electronics industry and rapid economic expansion. In addition, population growth in these countries serves as a huge customer base for the manufacturers of photoresist.

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Key companies profiled in the global photoresist market report include The Dow Chemical Company (U.S.), E.I. Du Pont de Nemours (U.S.), Fujifilm Electronics Materials Co., Ltd. (Japan), JSR Corporation (Japan), TOKYO OHKA KOGYO Co., LTD. (Japan), Shin-Etsu Chemical Co. Ltd. (Japan), Sumitomo Chemicals Co., Ltd. (Japan), Merck AZ Electronics Materials (Germany), and Microchemicals GmbH (Germany), ALLRESIST GmbH (Germany), Avantor Performance Materials, LLC (U.S.).

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