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Global Extreme Ultraviolet Lithography (EUVL) Market Is Expected to Grow USD 1,453.06 Million in 2024 at a Vigorous CAGR of 9.7%

Global Extreme Ultraviolet Lithography (EUVL) Market is expected to grow from USD 759.84 Million in 2017 to USD 1,453.06 Million in 2024 at a vigorous CAGR of 9.7% during the forecast period from 2018 to 2024.

 

London, UK -- (SBWIRE) -- 05/06/2019 -- Global Extreme Ultraviolet Lithography (EUVL) Market is expected to grow from USD 759.84 Million in 2017 to USD 1,453.06 Million in 2024 at a vigorous CAGR of 9.7% during the forecast period from 2018 to 2024.

Factors driving the growth of the market are increasing demand for more efficient and cost effective electronic components, and surging demand for high resolution. Higher resolution refers to the printing of small features onto a substrate. The usage of higher resolution exposure tool (3300) generates more output power, and this high power provides greater throughput, and leads to low cost of operation. Furthermore, emerging EUVL technology is also anticipated to replace the optical lithography techniques. Factors that may hamper the growth of the global extreme-ultraviolet lithography market are lack of technical expertise for the operation of EUV lithography, and lack of awareness among users. The years used for the assessment are as follows:

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Historical year : 2015, 2016
Base year : 2017
Forecast period : 2018 – 2024

RESEARCH METHODOLOGY

The research and analysis is based on data and information obtained from various primary and secondary sources. The data obtained is validated by interacting with the companies of the concerned domain. The steps involved in the research methodology are:

Obtaining historical data of the market based on news, articles, publications, annual reports, white papers, and other secondary sources
Interacting with key opinion leaders of the market and developing data points based on interaction with them
Study of past trends in the market and their year on year Impact on the market size and share
Analyzing the collected data points
Bridging the data points to calculate the total extreme ultraviolet lithography market and it various segments
Anticipating potential risks
Analyzing market forces such as drivers, restraints, and opportunities to assess new growth areas for the extreme ultraviolet lithography market
Finalizing the overall size and share for the global extreme ultraviolet lithography market

OBJECTIVES:

To classify the global extreme ultraviolet lithography market into segments by light source, tools, application, end-user, and region and analyze their growth prospects individually
To analyze market trends, opportunities, drivers and restraints associated with the extreme ultraviolet lithography market
Profiling key companies operating in the global extreme ultraviolet lithography market
To study market response with respect to the mergers and acquisitions in the industry

MARKET SCOPE

The research scope for global extreme ultraviolet lithography is as follows:

By Light Source
Light produced plasma
Vacuum sparks
Gas Discharges

By Tools
Mirrors
Photo-masks
Vacuum Tubes
Electrode Wheels
Si-Wafer
Multi Layer Objects
Absorber
Others

By Application
Light Emitting Diode (LED)
Micro-Fluidics
Micro-Needles
Memory
IDM
Foundry
Others

By End-User
Biotechnology
Consumer Electronics
Automotive
Robotics
Aerospace
Manufacturing Industries
Others

By Region
North America
Europe
Asia-Pacific (APAC)
Rest of the World (RoW)
Middle East and Africa
South America

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FREE ANALYSIS

The Global Extreme Ultraviolet Lithography (EUVL) Market is expected to grow from USD 759.8 Million in 2017 to USD 1,453.06 Million in 2024 at a CAGR of 9.7% during the forecast period from 2018 to 2024. Factors driving the growth of the market are increasing demand for more efficient and cost effective electronic components, and surging demand for high resolution. Moreover, very short wavelength of EUV also offers high resolution. Higher resolution refers to the printing of small features onto a substrate. The usage of higher resolution exposure tool (3300) generates more output power, and this high power provides greater throughput, and leads to low cost of operation. Furthermore, emerging EUVL technology is also anticipated to replace the optical lithography techniques. Factors that may hamper the growth of the global extreme-ultraviolet lithography market are lack of technical expertise for the operation of EUV lithography, and lack of awareness among users.

Extreme Ultraviolet Lithography is one of the next generation techniques of lithography in which a complex pattern is printed with the use of ultraviolet wavelengths that defines integrated circuits onto semiconductor wafer. It can hold compact electronic chips with very less power requirements; owing to successful installation of Extreme Ultraviolet Lithography (EUVL) uses mirrors in place of lenses, to acquire a phenomenon of reflection, rather than refraction. An extreme UVL finds its application in Light Emitting Diodes (LEDs), micro-fluidics, micro-Needles, biotechnology, memory, IDM, foundry, and others. This technology also offers certain advantages such as compact electronic chips, low power consumption, better output resolution, cost effectiveness, faster fabrication of transistors, and others.

Based on light source, laser produced plasma segment holds the largest share of the global extreme ultraviolet lithography market in 2017 owing to the short pulse laser beam technology. The vacuum spark segment is expected to be the fastest growing market segment in terms of revenue during the forecast period. On the basis of tools, the mirror segment holds the major market share. Based on end-user the aerospace segment was the fastest segment in the global extreme ultraviolet lithography in 2017.

Geographically, Asia-Pacific region is expected to grow at the highest rate during the forecast period owing to rising demand in the consumer electronics sector. Asia-Pacific also holds the major share of the global extreme ultraviolet lithography market in 2017.

Major players profiled in the global extreme ultraviolet lithography market include Intel Corporation, IBM, Infineon, Micron Technology, Samsung Corporation, Ultratech Inc., NuFlare Technology Inc., Qualcomm, NXP, Toshiba, Motorola, Canon Inc., and among others.

Available Customizations:

With the given market data, Ameco Research offers customizations according to the company's specific needs. The following customization options are available for the report: Regional and country-level analysis of the Xxxx, by end-use in detailed analysis and profiles of additional market players.

Table Of Contents

Global Extreme Ultraviolet Lithography (EUVL) Market Outlook, Trend and Opportunity Analysis, Competitive Insights, Actionable Segmentation & Forecast 2024

CHAPTER 1. Market Scope and Methodology

1.1. Market Definition

1.2. Market Segmentation

1.2.1. Market Breakdown, By Light Source

1.2.2. Market Breakdown, By Tool

1.2.3. Market Breakdown, By Application

1.2.4. Market Breakdown, By End-User

1.2.5. Market Breakdown, By Region

1.3. Research Methodology

1.3.1. Initial Data Search

1.3.2. Secondary Research

1.3.3. Primary Research

1.3.4. Scope and Assumptions

1.4. Sources

1.5. Executive Summary

CHAPTER 2. Market Outlook

2.1. Introduction

2.2. Market Outlook

2.2.1. Opportunities

2.2.1.1. Reduction in size of transistors and electronic circuits within microprocessors

2.2.2. Trends

2.2.2.1. Miniaturization of ICs

2.2.3. Growth Drivers

2.2.3.1. Increasing demand for more efficient and cost effective electronic components

2.2.3.2. Growing awareness among people regarding the next generation ultraviolet lithography and its applications

2.2.4. Impact Analysis of Drivers on Future Forecast of the Market

2.2.5. Restraints of the Market

2.2.5.1. Lack of technical expertise

2.2.5.2. Requirement of vacuum for entire operation

2.2.6. Impact Analysis of Restraints on Future Forecast of the Market

CHAPTER 3. Market Entry Strategy

3.1. Value Chain Analysis

3.2. Competitive Analysis

3.2.1. Company Market Share Analysis

3.2.2. Porter's Five Forces Analysis

CHAPTER 4. Global Extreme Ultraviolet Lithography Market Size and Forecast (2014 – 2024)

4.1. Global Extreme Ultraviolet Lithography Market, By Light Source

4.1.1. Light produced plasma

4.1.2. Vacuum sparks

4.1.3. Gas Discharges

4.2. Global Extreme Ultraviolet Lithography Market, By Tools

4.2.1. Mirrors

4.2.2. Photo-masks

4.2.3. Vacuum Tubes

4.2.4. Electrode Wheels

4.2.5. Si-Wafer

4.2.6. Multi Layer Objects

4.2.7. Absorber

4.2.8. Others

4.3. Global Extreme Ultraviolet Lithography Market, By Application

4.3.1. Light Emitting Diode (LED)

4.3.2. Micro-Fluidics

4.3.3. Micro-Needles

4.3.4. Memory

4.3.5. IDM

4.3.6. Foundry

4.3.7. Others

4.4. Global Extreme Ultraviolet Lithography Market, By End-User

4.4.1. Biotechnology

4.4.2. Consumer Electronics

4.4.3. Automotive

4.4.4. Robotics

4.4.5. Aerospace

4.4.6. Manufacturing Industries

4.4.7. Others

4.5. Global Extreme Ultraviolet Lithography Market, By Region

4.5.1. North America

4.5.2. Asia-Pacific

4.5.3. Europe

4.5.4. Rest of the World (RoW)

CHAPTER 5. Global Extreme Ultraviolet Lithography Market, By Geography

5.1. North America Extreme Ultraviolet Lithography Market

5.1.1. North America Extreme Ultraviolet Lithography Market, By Light Source (USD Million)

5.1.2. North America Extreme Ultraviolet Lithography Market, By Tool (USD Million)

5.1.3. North America Extreme Ultraviolet Lithography Market, By Application (USD Million)

5.1.4. North America Extreme Ultraviolet Lithography Market, By End-User (USD Million)

5.1.5. North America Extreme Ultraviolet Lithography Market, By Country

5.1.5.1. The U.S.

5.1.5.2. Canada

5.1.5.3. Mexico

5.2. Asia-Pacific Extreme Ultraviolet Lithography Market

5.2.1. Asia-Pacific Extreme Ultraviolet Lithography Market, By Light Source (USD Million)

5.2.2. Asia-Pacific Extreme Ultraviolet Lithography Market, By Tool (USD Million)

5.2.3. Asia-Pacific Extreme Ultraviolet Lithography Market, By Application (USD Million)

5.2.4. Asia-Pacific Extreme Ultraviolet Lithography Market, By End-User (USD Million)

5.2.5. Asia-Pacific Extreme Ultraviolet Lithography Market, By Country

5.2.5.1. China

5.2.5.2. Japan

5.2.5.3. India

5.2.5.4. Rest of Asia-Pacific

5.3. Europe Extreme Ultraviolet Lithography Market

5.3.1. Europe Extreme Ultraviolet Lithography Market, By Light Source (USD Million)

5.3.2. Europe Extreme Ultraviolet Lithography Market, By Tool (USD Million)

5.3.3. Europe Extreme Ultraviolet Lithography Market, By Application (USD Million)

5.3.4. Europe Extreme Ultraviolet Lithography Market, By End-User (USD Million)

5.3.5. Europe Extreme Ultraviolet Lithography Market, By Country

5.3.5.1. Germany

5.3.5.2. The U.K.

5.3.5.3. Spain

5.3.5.4. France

5.3.5.5. Rest of Europe

5.4. Rest of the World (RoW) Extreme Ultraviolet Lithography Market (USD Million)

5.4.1. Rest of the World (RoW) Extreme Ultraviolet Lithography Market, By Light Source (USD Million)

5.4.2. Rest of the World (RoW) Extreme Ultraviolet Lithography Market, By Tool (USD Million)

5.4.3. Rest of the World (RoW) Extreme Ultraviolet Lithography Market, By Application (USD Million)

5.4.4. Rest of the World (RoW) Extreme Ultraviolet Lithography Market, By End-User (USD Million)

5.4.5. Rest of the World (RoW) Extreme Ultraviolet Lithography Market, By Region (USD Million)

5.4.5.1. Middle East & Africa (MEA)

5.4.5.2. South America

CHAPTER 6. Key Players and Strategic Developments

6.1. Intel Corporation

6.1.1. Business Overview

6.1.2. Product and Service Offering

6.1.3. Financial Overview

6.1.4. SWOT Analysis

6.1.5. Strategic Developments

6.2. IBM Corporation

6.2.1. Business Overview

6.2.2. Product and Service Offering

6.2.3. Financial Overview

6.2.4. SWOT Analysis

6.2.5. Strategic Developments

6.3. Infineon

6.3.1. Business Overview

6.3.2. Product and Service Offering

6.3.3. Financial Overview

6.3.4. SWOT Analysis

6.3.5. Strategic Developments

6.4. Micron Technology

6.4.1. Business Overview

6.4.2. Product and Service Offering

6.4.3. Financial Overview

6.4.4. SWOT Analysis

6.4.5. Strategic Developments

6.5. Samsung Corporation

6.5.1. Business Overview

6.5.2. Product and Service Offering

6.5.3. Financial Overview

6.5.4. SWOT Analysis

6.5.5. Strategic Developments

6.6. Ultratech Inc.

6.6.1. Business Overview

6.6.2. Product and Service Offering

6.6.3. Financial Overview

6.6.4. SWOT Analysis

6.6.5. Strategic Developments

6.7. NuFlare Technology Inc.

6.7.1. Business Overview

6.7.2. Product and Service Offering

6.7.3. Financial Overview

6.7.4. SWOT Analysis

6.7.5. Strategic Developments

6.8. Qualcomm

6.8.1. Business Overview

6.8.2. Product and Service Offering

6.8.3. Financial Overview

6.8.4. SWOT Analysis

6.8.5. Strategic Developments

6.9. NXP

6.9.1. Business Overview

6.9.2. Product and Service Offering

6.9.3. Financial Overview

6.9.4. SWOT Analysis

6.9.5. Strategic Developments

6.10. Toshiba

6.10.1. Business Overview

6.10.2. Product and Service Offering

6.10.3. Financial Overview

6.10.4. SWOT Analysis

6.10.5. Strategic Developments

6.11. Abbreviation

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