This report provides valuable insights regarding ecosystem of this market such as product manufacturers and suppliers, OEMs, system integrators, suppliers and distributors, electronic device manufacturers, semiconductor device manufacturers, and standardization and testing firms. This study answers several questions for the stakeholders, primarily which market segments to focus on in next two to five years for prioritizing the efforts and investments.
Pune, India -- (SBWIRE) -- 01/27/2016 -- According to the new market research report "Photolithography (Equipment) Market by Type (i-line, KrF, ArF Dry, ArFi, and EUV), Light Source (Mercury Lamp, Excimer Laser, Fluorine Laser, and Laser Produced Plasma), Wavelength, and Region - Forecast to 2020", the market is estimated to reach USD 8.02 Billion by 2020, at a CAGR of 4.3% between 2015 and 2020.
Browse 75 market data Tables and 53 Figures spread through 160 Pages and in-depth TOC on "Photolithography (Equipment) Market"
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Factors such as growth in the semiconductor industry, requirement for advanced technical equipment, and government support are key drivers for photolithography equipment market. Moreover, adoption of photolithography equipments for advanced packaging application provides huge opportunity for further growth of this market.
ArFi equipment is expected to lead photolithography equipment market:
The ArFi equipment is widely used in the manufacturing of semiconductor devices for double and multi-layer pattering techniques.. This equipment is available at lower costs when compared to other equipment, which is tremendously increasing the growth of ArFi equipment in photolithography market.
EUV is expected to grow at the highest CAGR between 2015 and 2020
The EUV equipment is expected to grow at the highest CAGR between 2015 and 2020. This is mainly due to the fact that EUV has several advantages over other equipment such as improved wavelength, and lower operational and maintenance cost for semiconductor devices. EUV generates wavelength of the order of 13nm, which is being used in the photolithography equipment to manufacture semiconductor devices. Thus, the manufactures have started giving preference to EUV equipment.
APAC is expected to hold the highest market share and grow at a high CAGR during the forecast period
APAC accounted for the largest share in the photolithography equipment market in 2014; and is expected to grow at the highest CAGR between 2015 and 2020. The growth is attributed to increasing industrialization and urbanization in the region. Further, the increasing semiconductor manufacturing capacity in the countries such as China, Taiwan, and South Korea are key factors responsible for the increasing adoption of photolithography equipment.
Major players operating in this market are ASML Holdings, N.V. (The Netherlands), Nikon Corporation (Japan), Canon, Inc. (Japan), JEOL Ltd. (Japan), NuFlare Technology, Inc.(Japan), Ultratech, Inc. (U.S.), Rudolph Technologies, Inc. (U.S.), SUSS Mictotec, A.G. (Germany), Nil Technology (Denmark), and EV Group (U.S.).
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This research report categorizes the global photolithography equipment market based on type, light source, wavelength, and region. This report describes the drivers, restraints, opportunities, and challenges with respect to the photolithography equipment market. .The Porter's five forces analysis has been included in the report with a description of each of its forces and their respective impact on the photolithography equipment market.
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