Remote Plasma Source Market to Develop Rapidly by 2017- 2027
A remote plasma source is installed on a vacuum chamber to remove hydrocarbon contaminants which are extremely difficult to remove with conventional gas purging methods. Remote plasma sources have usually been used in semiconductor processing applications, including dry removal of photoresist. They can also be used to remove the last layer of impurities from a surface to make the surface clean at a molecular level. Contamination removal from semiconductor equipment, such as critical dimension scanning electron microscopes, XPS, SIMS (secondary...
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