Tetramethyl Ammonium Hydroxide Market Is Presumed to Grow at a Cagr of 6.7% Between 2019 and 2025
Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium alkali with the molecular formula (CH3)4NOH. It is widely used in micro-or nanofabrication as an etchant and developer. One of the industrial uses of TMAH is for the anisotropic etching of silicon. It is used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist. TMAH has some phase transfer catalyst properties, and is used as a surfactant in the synthesis of...
View full press release