High-K and ALD/CVD Metal Precursors Market Study Analysis and Forecast by 2025
The drive for demand for chemical vapor deposition (CVD) techniques stems from the declining performance and lack of reliability of conventional SiO2 gate dielectrics. CVD and its usually considered subset atomic layer deposition (ALD) are thin film deposition techniques used in semiconductor device manufacturing. These processes are used to deposit multi-component thin films by the co-injecting Hf and Si precursors, leading to the formation of homogeneous single-layer films, endowing excellent electric properties of dielectric materials. These thin films have wide...
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