Copper Sputtering Target Market - the Advancement of Semiconductors for Consumer Electronics Such as Smartphones, Tablets and Computers
Sputtering is a technology that allows thin film deposition of an ultra-high purity sputtering metallic or oxide material on another solid substance. Copper sputtering target are developed that has low electric resistance for the component, which can performs high-speed operation for a computer. Furthermore, to acquire the deposited thin film uniformity, copper sputtering target has an average grain size of ~30 µm and 17% of un- uniformity deposition through an annealing temperature of 0.4 Tm. Neon, krypton, xenon and argon...
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